Semiconductor equipment opticsPalo Alto, California
    SEMICONDUCTOR / EXPOSURE / INSPECTION

    Optical subsystems for semiconductor equipment, from process requirement to qualified hardware.

    Palo Alto Optics designs and develops illumination, imaging, projection, alignment, and optomechanical subsystems for semiconductor-equipment teams. PAO is a fit for new architectures, subsystem recovery, prototype integration, or production transfer, and can deliver optical models, tolerance analyses, drawings, calibrated prototype hardware, verification plans, measured acceptance evidence, and supplier-ready release documentation.

    SYSTEM WORKFLOWPAO / 01
    01Process
    02Optical architecture
    03Integrated subsystem
    04Calibration
    05Release

    Silicon Valley technical leadership with managed engineering and production resources.

    The optical design must close at the equipment level.

    Resolution or irradiance alone does not define a successful subsystem. Process window, field, focus, motion, thermal behavior, contamination, calibration, service, and supplier capability have to be resolved together.

    01

    Process-to-optics translation

    Convert substrate, resist, defect, throughput, and dose requirements into measurable optical budgets.

    02

    Stable equipment integration

    Control alignment, thermal drift, stray light, contamination exposure, access, and mechanical interfaces.

    03

    A credible production path

    Specify fabrication, assembly, calibration, acceptance testing, and configuration control before release.

    Contact PAO when an exposure, inspection, alignment, or metrology requirement must become a stable equipment subsystem.

    The best fit is an equipment team defining a new optical architecture, recovering a subsystem that misses process performance, or preparing a prototype for calibrated, supplier-controlled builds.

    01

    Process requirements need an optical budget

    Feature, dose, throughput, substrate, focus, or defect requirements must be translated into source, imaging, motion, and calibration decisions.

    02

    Subsystem behavior is unstable

    Uniformity, focus, distortion, registration, thermal drift, contamination, or alignment changes are limiting the usable process window.

    03

    A prototype needs a production path

    The design requires controlled optics, optomechanics, calibration fixtures, acceptance data, and supplier-ready documentation.

    ENGINEERING DECISION TABLE

    Inputs that change the architecture, acceptance method, and program risk.

    Input conditionKey metricDesign choiceRisk if unresolved
    Process feature and substrateResolution, contrast, dose, defect detectabilityImaging or projection NA, wavelength, illumination modeThe optical model does not produce the required process window.
    Field, stage, and throughputUniformity, distortion, stitching, exposure timeFull-field, scanning, line-scan, or tiled architectureRegistration or throughput fails at equipment scale.
    Working plane and environmentFocus margin, thermal drift, contamination sensitivityTelecentricity, focus control, sealing, thermal strategyPerformance changes with duty cycle or tool condition.
    Calibration and service modelRepeatability, traceability, recalibration intervalDatums, reference artifacts, fixtures, correction mapsA good prototype cannot be installed, maintained, or reproduced.
    SELECTED ENGINEERING EVIDENCE

    Published scope, verification method, and disclosure boundary.

    These records describe documented engineering experience or the evidence plan PAO uses for new work. They do not imply that prior-employer programs were PAO customer engagements.

    UV exposure optical-engine pathways

    Scope
    Reference DMD line-imaging and solder-mask optical-engine configurations covering source, homogenization, projection, optomechanics, and calibration interfaces.
    Verification
    Working-plane uniformity, dose, focus, distortion, registration, or image-quality methods are selected from the customer process.
    Boundary
    Published reference images demonstrate available engineering pathways, not guaranteed values for an unreviewed process.
    Review DMD exposure engineering

    Controlled subsystem acceptance

    Scope
    Requirements trace, optical and mechanical release, calibration definition, supplier review, and subsystem acceptance plan.
    Verification
    Measured maps and image data are tied to test conditions, configuration, equipment, and agreed acceptance limits.
    Boundary
    Customer programs and confidential performance data are not published; new results remain governed by the project NDA.
    Review UV illumination systems

    One accountable optical workstream across the subsystem.

    PAO can enter at architecture, redesign, prototype, or transfer stage and maintain the technical thread through verification.

    Define a technical work package
    01

    Requirements and architecture

    System boundary, performance budgets, source and detector trades, working distance, field strategy, and risk retirement.

    02

    Illumination engineering

    UV and visible source integration, homogenization, pupil control, telecentricity, radiometry, and thermal management.

    03

    Imaging and projection

    Lens design, resolution, distortion, focus margin, depth of field, spectral behavior, and detector or DMD integration.

    04

    Alignment and optomechanics

    Datums, retention, adjustment, tolerance allocation, motion interfaces, service access, and environmental stability.

    05

    Calibration and verification

    Uniformity, focus, distortion, registration, image quality, alignment checks, and acceptance criteria.

    06

    Prototype and release

    Supplier-ready specifications, build support, issue resolution, qualification planning, and controlled design transfer.

    Subsystems matched to the equipment architecture.

    Representative capability is shown with the context needed to qualify it. Program requirements control the final architecture and acceptance values.

    01

    Maskless lithography

    DMD illumination and projection paths developed around dose, feature size, field stitching, and focus control.

    02

    UV exposure

    Collimated or homogenized illumination for wafer, substrate, PCB, and process-tool applications.

    03

    AOI and inspection

    Large-format, line-scan, bright-field, dark-field, and application-specific illumination and imaging.

    04

    Alignment and metrology

    Fiducial imaging, registration, focus sensing, dimensional measurement, and calibration optics.

    REFERENCE ENVELOPE
    Spectral regionsUV to visibleCommon exposure bands include 365, 385, and 405 nm
    Exposure formats4 to 12 inch classArchitecture selected around field, process, and handling constraints
    Large-area illuminationUp to 400 x 500 mm reference classAvailable configuration, subject to full requirements review
    VerificationMapped at the working planeUniformity, dose, focus, distortion, or image quality as applicable

    Reference envelopes show available engineering and production pathways, not a universal product specification. Final values are established from the customer's process, environment, and acceptance method.

    Engineering outputs your team can review, build, test, and maintain.

    The exact package follows the program stage and scope. Assumptions, interfaces, decisions, and acceptance evidence remain visible.

    System architecture package

    Requirements trace, optical layout, interface definition, budgets, and documented trade decisions.

    Optical design package

    Models, prescriptions, coatings, tolerances, analyses, and controlled optical specifications.

    Optomechanical definition

    Datums, interfaces, mounts, adjustment strategy, drawings, and assembly considerations.

    Calibration plan

    Fixtures, algorithms or procedures, reference artifacts, maps, and calibration acceptance limits.

    Verification plan

    Test methods, equipment, sampling, data outputs, and subsystem acceptance criteria.

    Production transfer support

    Supplier review, prototype build support, nonconformance disposition, and release documentation.

    A local engineering interface from first review through release.

    PAO leads the technical work, coordinates specialized fabrication and production resources under the project quality process, and keeps responsibility for requirements, interfaces, evidence, and issue closure clear.

    1. 01

      Technical intake

      Define the system boundary, decision to be made, current evidence, constraints, and confidentiality path.

    2. 02

      Requirements and risk

      Create measurable requirements, interface assumptions, performance budgets, and a ranked technical risk register.

    3. 03

      Architecture and proof

      Compare viable concepts and retire the highest-risk assumptions with analysis, breadboards, or targeted tests.

    4. 04

      Detailed engineering

      Develop controlled optical, mechanical, calibration, test, and supplier-ready documentation.

    5. 05

      Build and verification

      Support procurement, assembly, alignment, test correlation, root cause, and evidence-based iteration.

    6. 06

      Release and transfer

      Close acceptance criteria, configuration, supplier questions, manufacturing issues, and production handoff.

    Questions engineering teams ask before engaging.

    01Can PAO develop only the optical subsystem rather than the full machine?

    Yes. The scope can cover a defined illumination, imaging, projection, alignment, or metrology subsystem with controlled electrical, mechanical, software, and process interfaces.

    02Can you support an existing design that is not meeting performance?

    Yes. A diagnostic engagement can compare measured behavior with the optical and tolerance models, identify dominant contributors, and define a focused recovery plan.

    03How early should production constraints enter the program?

    Fabrication, coating, assembly, calibration, and acceptance constraints should enter during architecture. This prevents a high-performing model from becoming an unstable or uneconomic subsystem.

    04What determines semiconductor optical subsystem cost and schedule?

    The main drivers are wavelength, custom optical complexity, field size, tolerance and stability requirements, calibration hardware, prototype quantity, supplier lead times, and the completeness of existing requirements and data. PAO defines these drivers during technical intake before committing a work package.

    05Can we begin under an NDA?

    Yes. The first discussion can stay at a non-confidential level, then detailed process data, drawings, models, and failure information can move through an agreed NDA channel.

    06Can PAO support prototype build and manufacturing transfer?

    Yes. Scope can include supplier packages, quote and drawing review, component sourcing support, assembly and alignment planning, calibration, verification, issue closure, and controlled release to the customer's manufacturing path.

    Bring us the equipment requirement or the failure mode.

    We can begin with a requirements review, an architecture study, or a focused investigation of an existing subsystem.